1. Microlithography Introduction
A brief introduction to the history of integrated circuits, with a special emphasis on the importance of photolithography and an introduction to lithography simulation.

2. Introduction to DNQ-Novolak Resists
A more in depth discussion of photoresists, the imaging materials used to define patterns in integrated circuit manufacturing using photolithographic techniques, with a focus on the diazonaphthoquinone-novolac photoresists (DNQ-novolac). DNQ novolac resists are used for G, H, and I-line exposure and have been the "work horse" resists for microelectronics fabrication for over 30 years.

3. Introduction to Chemically Amplified Resists
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4. Fundamentals of Electron Beam Lithography
A short introduction to electron beam lithography, including information on the basic physics of electron-solid interactions and the types of photoresist materials used for electron beam exposure.